- AutorIn
- Frank Wirbeleit
- Titel
- Arsenic diffusivity study by comparison of post-Surface and post-implant diffusion in silicon with Local Density Diffusion (LDD-) model approximation
- Zitierfähige Url:
- https://nbn-resolving.org/urn:nbn:de:bsz:15-qucosa-186124
- Quellenangabe
- Diffusion fundamentals - 15
- Quellenangabe
- Diffusion fundamentals 15 (2011) 3, S. 1-10
- Erstveröffentlichung
- 2011
- Abstract (EN)
- The LDD model was first applied to Arsenic concentration profiles determined in surface diffusion experiments by Yoshida and Arai [1]. The new method presented is based on a mathematical convolution with a delta-function-like concentration profile. By comparing the LDD approximation of post-surface diffusion with post-implant diffusion experiments, the same LDD model parameter r is found to hold for both experimental arrangements. This work found that post-implant diffusivity is concentration dependant and this might indicate an anomalous diffusion mechanism for Arsenic.
- Freie Schlagwörter (DE)
- Diffusion, Transport
- Freie Schlagwörter (EN)
- diffusion, transport
- Klassifikation (DDC)
- 530
- Herausgeber (Institution)
- GLOBAL FOUNDRIES
- Universität Leipzig
- URN Qucosa
- urn:nbn:de:bsz:15-qucosa-186124
- Veröffentlichungsdatum Qucosa
- 29.10.2015
- Dokumenttyp
- Artikel
- Sprache des Dokumentes
- Englisch