Influence of Si Surface Orientation on Screen-printed Ag/Al Contacts

Lade...
Vorschaubild
Dateien
Fritz_0-304240.pdf
Fritz_0-304240.pdfGröße: 1.64 MBDownloads: 241
Datum
2015
Herausgeber:innen
Kontakt
ISSN der Zeitschrift
Electronic ISSN
ISBN
Bibliografische Daten
Verlag
Schriftenreihe
Auflagebezeichnung
ArXiv-ID
Internationale Patentnummer
Link zur Lizenz
Angaben zur Forschungsförderung
Projekt
Open Access-Veröffentlichung
Open Access Gold
Sammlungen
Core Facility der Universität Konstanz
Gesperrt bis
Titel in einer weiteren Sprache
Forschungsvorhaben
Organisationseinheiten
Zeitschriftenheft
Publikationstyp
Zeitschriftenartikel
Publikationsstatus
Published
Erschienen in
Energy Procedia. 2015, 77, pp. 581-585. eISSN 1876-6102. Available under: doi: 10.1016/j.egypro.2015.07.083
Zusammenfassung

In this study the influence of the crystallographic surface orientation of n-type Si wafers on the contact formation of Ag/Al thick film pastes to p+-type Si layers is investigated. Therefore, n-type Si wafers with two different crystallographic orientations, namely polished (111) and (100) FZ wafers, with BBr3 based emitter and 75 nm SiNx:H are screen-printed with Ag/Al paste. Then contacts are fired in either a slow firing process or a fast one with the same peak temperature. Afterwards, contacts are prepared for scanning electron microscopy (SEM) analysis. The Ag/Al contact spots show different shapes on the differently oriented surfaces. For the slow firing process, no significant difference in number and size of the contacts spots can be found for the two surfaces. For samples fired in the fast firing process, the density and size of the contact spots on (100)-oriented surfaces is strongly reduced, whereas for the (111) surfaces only a slight reduction in density is visible as compared to the slow firing process.

Zusammenfassung in einer weiteren Sprache
Fachgebiet (DDC)
530 Physik
Schlagwörter
Konferenz
Rezension
undefined / . - undefined, undefined
Zitieren
ISO 690FRITZ, Susanne, Stefanie EBERT, Axel HERGUTH, Giso HAHN, 2015. Influence of Si Surface Orientation on Screen-printed Ag/Al Contacts. In: Energy Procedia. 2015, 77, pp. 581-585. eISSN 1876-6102. Available under: doi: 10.1016/j.egypro.2015.07.083
BibTex
@article{Fritz2015Influ-32031,
  year={2015},
  doi={10.1016/j.egypro.2015.07.083},
  title={Influence of Si Surface Orientation on Screen-printed Ag/Al Contacts},
  volume={77},
  journal={Energy Procedia},
  pages={581--585},
  author={Fritz, Susanne and Ebert, Stefanie and Herguth, Axel and Hahn, Giso}
}
RDF
<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/32031">
    <dcterms:abstract xml:lang="eng">In this study the influence of the crystallographic surface orientation of n-type Si wafers on the contact formation of Ag/Al thick film pastes to p+-type Si layers is investigated. Therefore, n-type Si wafers with two different crystallographic orientations, namely polished (111) and (100) FZ wafers, with BBr3 based emitter and 75 nm SiNx:H are screen-printed with Ag/Al paste. Then contacts are fired in either a slow firing process or a fast one with the same peak temperature. Afterwards, contacts are prepared for scanning electron microscopy (SEM) analysis. The Ag/Al contact spots show different shapes on the differently oriented surfaces. For the slow firing process, no significant difference in number and size of the contacts spots can be found for the two surfaces. For samples fired in the fast firing process, the density and size of the contact spots on (100)-oriented surfaces is strongly reduced, whereas for the (111) surfaces only a slight reduction in density is visible as compared to the slow firing process.</dcterms:abstract>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2015-10-30T13:41:31Z</dc:date>
    <dcterms:issued>2015</dcterms:issued>
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/32031/1/Fritz_0-304240.pdf"/>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2015-10-30T13:41:31Z</dcterms:available>
    <dc:contributor>Ebert, Stefanie</dc:contributor>
    <dcterms:rights rdf:resource="http://creativecommons.org/licenses/by-nc-nd/4.0/"/>
    <dc:creator>Herguth, Axel</dc:creator>
    <dc:contributor>Hahn, Giso</dc:contributor>
    <dc:creator>Hahn, Giso</dc:creator>
    <dc:language>eng</dc:language>
    <dc:contributor>Herguth, Axel</dc:contributor>
    <dcterms:title>Influence of Si Surface Orientation on Screen-printed Ag/Al Contacts</dcterms:title>
    <dc:creator>Ebert, Stefanie</dc:creator>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dc:contributor>Fritz, Susanne</dc:contributor>
    <dc:creator>Fritz, Susanne</dc:creator>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/32031"/>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/32031/1/Fritz_0-304240.pdf"/>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:rights>Attribution-NonCommercial-NoDerivatives 4.0 International</dc:rights>
  </rdf:Description>
</rdf:RDF>
Interner Vermerk
xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter
Kontakt
URL der Originalveröffentl.
Prüfdatum der URL
Prüfungsdatum der Dissertation
Finanzierungsart
Kommentar zur Publikation
Allianzlizenz
Corresponding Authors der Uni Konstanz vorhanden
Internationale Co-Autor:innen
Universitätsbibliographie
Ja
Begutachtet
Diese Publikation teilen