The origin of background plating

Lade...
Vorschaubild
Dateien
Braun_159194.pdf
Braun_159194.pdfGröße: 1.39 MBDownloads: 411
Datum
2011
Herausgeber:innen
Kontakt
ISSN der Zeitschrift
Electronic ISSN
ISBN
Bibliografische Daten
Verlag
Schriftenreihe
Auflagebezeichnung
ArXiv-ID
Internationale Patentnummer
Angaben zur Forschungsförderung
Projekt
Open Access-Veröffentlichung
Open Access Gold
Sammlungen
Core Facility der Universität Konstanz
Gesperrt bis
Titel in einer weiteren Sprache
Forschungsvorhaben
Organisationseinheiten
Zeitschriftenheft
Publikationstyp
Zeitschriftenartikel
Publikationsstatus
Published
Erschienen in
Energy Procedia. 2011, 8, pp. 565-570. ISSN 1876-6102. Available under: doi: 10.1016/j.egypro.2011.06.183
Zusammenfassung

In the last years efforts were made to overcome the widespread screen printing metallization technique to reduce shading of the front side, increase the finger conductivity, and improve the contact properties of the metallization of crystalline silicon solar cells. A promising approach is plating via wet chemical metal deposition. Hereby, the metals nickel as contact layer and copper or silver as conduction layer are alternatives to the thick film screen printing process. One challenge using this technique is to avoid the unwanted background plating where the metal is not only deposited on the opened emitter structures but also partly on the isolating surface of the silicon nitride layer.

In this paper a detailed overview of the origin of background plating is given, documented by scanning electron microscope pictures. By cutting a groove in the surface of the sample and milling the unwanted metallization as well as the silicon underneath in 12.5 nm steps with a focused gallium ion beam, it was possible to investigate the cross sections by EDX and reveal different origins for the background plating behavior.

Zusammenfassung in einer weiteren Sprache
Fachgebiet (DDC)
530 Physik
Schlagwörter
background plating, nickel, copper, shading, shunting
Konferenz
Rezension
undefined / . - undefined, undefined
Zitieren
ISO 690BRAUN, Stefan, Annika ZUSCHLAG, Bernd RAABE, Giso HAHN, 2011. The origin of background plating. In: Energy Procedia. 2011, 8, pp. 565-570. ISSN 1876-6102. Available under: doi: 10.1016/j.egypro.2011.06.183
BibTex
@article{Braun2011origi-15919,
  year={2011},
  doi={10.1016/j.egypro.2011.06.183},
  title={The origin of background plating},
  volume={8},
  issn={1876-6102},
  journal={Energy Procedia},
  pages={565--570},
  author={Braun, Stefan and Zuschlag, Annika and Raabe, Bernd and Hahn, Giso}
}
RDF
<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/15919">
    <dc:rights>Attribution-NonCommercial-NoDerivs 3.0 Unported</dc:rights>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/15919/2/Braun_159194.pdf"/>
    <dcterms:issued>2011</dcterms:issued>
    <dcterms:bibliographicCitation>Publ. in: Energy Procedia ; 8 (2011). - pp. 565-570</dcterms:bibliographicCitation>
    <dc:language>eng</dc:language>
    <dc:creator>Raabe, Bernd</dc:creator>
    <dcterms:title>The origin of background plating</dcterms:title>
    <dc:creator>Braun, Stefan</dc:creator>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dc:contributor>Braun, Stefan</dc:contributor>
    <dc:creator>Hahn, Giso</dc:creator>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-09-29T06:59:10Z</dc:date>
    <dcterms:rights rdf:resource="http://creativecommons.org/licenses/by-nc-nd/3.0/"/>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dcterms:abstract xml:lang="eng">In the last years efforts were made to overcome the widespread screen printing metallization technique to reduce shading of the front side, increase the finger conductivity, and improve the contact properties of the metallization of crystalline silicon solar cells. A promising approach is plating via wet chemical metal deposition. Hereby, the metals nickel as contact layer and copper or silver as conduction layer are alternatives to the thick film screen printing process. One challenge using this technique is to avoid the unwanted background plating where the metal is not only deposited on the opened emitter structures but also partly on the isolating surface of the silicon nitride layer.&lt;br /&gt;&lt;br /&gt;In this paper a detailed overview of the origin of background plating is given, documented by scanning electron microscope pictures. By cutting a groove in the surface of the sample and milling the unwanted metallization as well as the silicon underneath in 12.5 nm steps with a focused gallium ion beam, it was possible to investigate the cross sections by EDX and reveal different origins for the background plating behavior.</dcterms:abstract>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/15919"/>
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/15919/2/Braun_159194.pdf"/>
    <dc:contributor>Zuschlag, Annika</dc:contributor>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-09-29T06:59:10Z</dcterms:available>
    <dc:creator>Zuschlag, Annika</dc:creator>
    <dc:contributor>Raabe, Bernd</dc:contributor>
    <dc:contributor>Hahn, Giso</dc:contributor>
  </rdf:Description>
</rdf:RDF>
Interner Vermerk
xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter
Kontakt
URL der Originalveröffentl.
Prüfdatum der URL
Prüfungsdatum der Dissertation
Finanzierungsart
Kommentar zur Publikation
Allianzlizenz
Corresponding Authors der Uni Konstanz vorhanden
Internationale Co-Autor:innen
Universitätsbibliographie
Ja
Begutachtet
Diese Publikation teilen