Size-selected Au clusters deposited on SiO2/Si : Stability of clusters under ambient pressure and elevated temperatures

Lim, Dong Chan; Dietsche, Rainer; Ganteför, Gerd; Kim, Young Dok

Size-selected Au clusters deposited on SiO2/Si : Stability of clusters under ambient pressure and elevated temperatures

Dateien

Gantefoer_applied2009.pdfGröße: 338.35 KBDownloads: 426

Datum

2009

Autor:innen

Lim, Dong Chan

Dietsche, Rainer

Ganteför, Gerd

Kim, Young Dok

Open Access-Veröffentlichung

Open Access Green

Sammlungen

Physik

Publikationstyp

Zeitschriftenartikel

Publikationsstatus

Published

Erschienen in

Applied Surface Science. 2009, 256(4), pp. 1148-1151. Available under: doi: 10.1016/j.apsusc.2009.05.071

Zusammenfassung

This study examined the oxidation and reduction behavior of mass-selected Au clusters consisting of 2 13 atoms deposited on silica. An atomic oxygen environment was used for the oxidation of Au. X-ray photoelectron spectroscopy (XPS) was used to identify Au(III) and Au(O). Au5, Au7 and Au13 clusters deposited on the as-prepared SiO2/Si substrates were highly inert towards oxidation, whereas the other clusters could be oxidized, i.e. the chemical property drastically changed with the number of atoms in a cluster. The size-selectivity in chemical reactivity remained unchanged upon air-exposure. The chemical properties of the deposited Au clusters were unchanged after annealing at 250 °C. Annealing at higher temperatures caused structural changes to the surface, as determined by the oxidation behavior. XPS of the deposited Au clusters upon annealing indicated charge transfer from Au to silica.

Fachgebiet (DDC)

530 Physik

Schlagwörter

Au, SiO2, Mass-selected clusters, Oxidation

Zitieren

ISO 690

LIM, Dong Chan, Rainer DIETSCHE, Gerd GANTEFÖR, Young Dok KIM, 2009. Size-selected Au clusters deposited on SiO2/Si : Stability of clusters under ambient pressure and elevated temperatures. In: Applied Surface Science. 2009, 256(4), pp. 1148-1151. Available under: doi: 10.1016/j.apsusc.2009.05.071

BibTex

@article{Lim2009Sizes-8979,
  year={2009},
  doi={10.1016/j.apsusc.2009.05.071},
  title={Size-selected Au clusters deposited on SiO2/Si : Stability of clusters under ambient pressure and elevated temperatures},
  number={4},
  volume={256},
  journal={Applied Surface Science},
  pages={1148--1151},
  author={Lim, Dong Chan and Dietsche, Rainer and Ganteför, Gerd and Kim, Young Dok}
}

RDF

<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/8979">
    <dcterms:abstract xml:lang="eng">This study examined the oxidation and reduction behavior of mass-selected Au clusters consisting of 2 13 atoms deposited on silica. An atomic oxygen environment was used for the oxidation of Au. X-ray photoelectron spectroscopy (XPS) was used to identify Au(III) and Au(O). Au5, Au7 and Au13 clusters deposited on the as-prepared SiO2/Si substrates were highly inert towards oxidation, whereas the other clusters could be oxidized, i.e. the chemical property drastically changed with the number of atoms in a cluster. The size-selectivity in chemical reactivity remained unchanged upon air-exposure. The chemical properties of the deposited Au clusters were unchanged after annealing at 250 °C. Annealing at higher temperatures caused structural changes to the surface, as determined by the oxidation behavior. XPS of the deposited Au clusters upon annealing indicated charge transfer from Au to silica.</dcterms:abstract>
    <dc:contributor>Kim, Young Dok</dc:contributor>
    <dcterms:rights rdf:resource="https://rightsstatements.org/page/InC/1.0/"/>
    <dc:creator>Kim, Young Dok</dc:creator>
    <dc:contributor>Dietsche, Rainer</dc:contributor>
    <dc:creator>Dietsche, Rainer</dc:creator>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:creator>Lim, Dong Chan</dc:creator>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:rights>terms-of-use</dc:rights>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/8979/1/Gantefoer_applied2009.pdf"/>
    <dc:contributor>Ganteför, Gerd</dc:contributor>
    <dc:format>application/pdf</dc:format>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T17:52:34Z</dcterms:available>
    <dcterms:issued>2009</dcterms:issued>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T17:52:34Z</dc:date>
    <dc:language>eng</dc:language>
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/8979/1/Gantefoer_applied2009.pdf"/>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/8979"/>
    <dcterms:title>Size-selected Au clusters deposited on SiO2/Si : Stability of clusters under ambient pressure and elevated temperatures</dcterms:title>
    <dcterms:bibliographicCitation>First. publ. in: Applied Surface Science 256 (2009), 4, pp. 1148 1151</dcterms:bibliographicCitation>
    <dc:creator>Ganteför, Gerd</dc:creator>
    <dc:contributor>Lim, Dong Chan</dc:contributor>
  </rdf:Description>
</rdf:RDF>

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