Fabrication of noble-metal nanoconstrictions and observation of conductance fluctuations
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We describe the fabrication of planar metallic nanostructures with lateral dimensions down to about 80 nm and thicknesses varying from 15 to 50 nm. We use a lift-off process with a polymethylmethacerylate bilayer resist on silicon substrate and an electron beam writer system for microfabrication. The noble-metal layers are deposited by thermal evaporation. The geometries are point contacts, rings, and wires in two-lead configuration. We discuss measurements of the magnetoconductance at very low temperatures and in magnetic fields up to 4 T in dependence of the width of the samples. Here the electron transport is in the diffusive regime and the width dependence of the universal conductance fluctuations is investigated.
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SCHEER, Elke, Hilbert von LĂ–HNEYSEN, Herbert HEIN, 1994. Fabrication of noble-metal nanoconstrictions and observation of conductance fluctuations. In: Journal of Vacuum Science and Technology B. 1994, 12(6), pp. 3171-3175. Available under: doi: 10.1116/1.587494BibTex
@article{Scheer1994Fabri-4816, year={1994}, doi={10.1116/1.587494}, title={Fabrication of noble-metal nanoconstrictions and observation of conductance fluctuations}, number={6}, volume={12}, journal={Journal of Vacuum Science and Technology B}, pages={3171--3175}, author={Scheer, Elke and Löhneysen, Hilbert von and Hein, Herbert} }
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