@article{Boneberg1997forma-5171,
  year={1997},
  doi={10.1021/la9704922},
  title={The formation of nano-dot and nano-ring structures in colloidal monolayer lithography},
  number={26},
  volume={13},
  issn={0743-7463},
  journal={Langmuir : the ACS journal of surfaces and colloids},
  pages={7080--7084},
  author={Boneberg, Johannes and Burmeister, Frank and Schäfle, Claudia and Leiderer, Paul and Reim, D. and Fery, Andreas and Herminghaus, Stephan}
}

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    <dc:contributor>Fery, Andreas</dc:contributor>
    <dc:contributor>Boneberg, Johannes</dc:contributor>
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    <dc:contributor>Reim, D.</dc:contributor>
    <dc:contributor>Schäfle, Claudia</dc:contributor>
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    <dc:creator>Reim, D.</dc:creator>
    <dc:creator>Boneberg, Johannes</dc:creator>
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    <dc:creator>Schäfle, Claudia</dc:creator>
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    <dc:creator>Herminghaus, Stephan</dc:creator>
    <dc:contributor>Burmeister, Frank</dc:contributor>
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    <dc:contributor>Herminghaus, Stephan</dc:contributor>
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    <dcterms:abstract xml:lang="eng">Monolayers of colloidal particles formed in a self-organizingpmcess upon dryingof a colloidal suspension arc used as lithographic masks. After deposition of a thin metal layer, the mask is detached from the surface. The resulting surface is examined with optical, scanning electron, and atomic force microscopes. In addition to the well-known triangular structures, which reflect the gaps in the hexagonal arrangement of the particles, we observed the following additional features: hillocks (nano-dots) found just below and nano-rings found around the original location of the particles. These features may develop during detachment (hillocks) and formation (rings) of the mask, respectively. Hillocks develop as a consequence of the adhesion of the particles on the surface, whereas rings are formed h m organic residuals in the suspension. We show that these features can be used to fabricate fluorescent dye rings of submicron size.</dcterms:abstract>
    <dc:creator>Burmeister, Frank</dc:creator>
    <dcterms:title>The formation of nano-dot and nano-ring structures in colloidal monolayer lithography</dcterms:title>
    <dc:creator>Fery, Andreas</dc:creator>
    <dc:contributor>Leiderer, Paul</dc:contributor>
    <dc:creator>Leiderer, Paul</dc:creator>
    <dcterms:bibliographicCitation>First publ. in: Langmuir 13 (1997), 26, pp. 7080-7084</dcterms:bibliographicCitation>
    <dcterms:issued>1997</dcterms:issued>
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