@article{Mosbacher2001Optic-8855,
  year={2001},
  doi={10.1007/s003390000715},
  title={Optical field enhancement effects in laser-assisted particle removal},
  number={1},
  volume={72},
  journal={Applied Physics / A, Materials Science and Processing},
  pages={41--44},
  author={Mosbacher, Mario and Münzer, Hans-Joachim and Zimmermann, Jörg and Solis Cespedes, Francisco Javier and Boneberg, Johannes and Leiderer, Paul}
}

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    <dcterms:title>Optical field enhancement effects in laser-assisted particle removal</dcterms:title>
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    <dc:creator>Solis Cespedes, Francisco Javier</dc:creator>
    <dc:creator>Zimmermann, Jörg</dc:creator>
    <dc:creator>Münzer, Hans-Joachim</dc:creator>
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    <dcterms:abstract xml:lang="eng">We report on the role of local optical field enhancement in the neighbourhood of particles during dry laser cleaning (DLC) of silicon wafer surfaces. Samples covered with spherical colloidal particles (PS, SiO2) and arbitrarily shaped Al2O3 particles with diameters from 320 1700 nm were cleaned using laser pulses with durations from 150 fs to 6.5 ns and wavelengths ranging from 400 800 nm. Cleaned areas were investigated with scanning electron and atomic force microscopy. Holes in the substrate with diameters of 200 400 nm and depths of 10 80 nm, depending on the irradiation conditions, were found at the former positions of the particles. For all pulse durations analyzed (fs, ps, ns), holes are created at laser fluences as small as the threshold fluence. Calculations of the optical field intensities in the particles  neighbourhood by applying Mie theory suggest that enhancement of the incident laser intensity in the near field of the particles is responsible for these effects. DLC for sub-ns pulses seems to be governed by the local ablation of the substrate rather than by surface acceleration.</dcterms:abstract>
    <dc:contributor>Solis Cespedes, Francisco Javier</dc:contributor>
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    <dc:contributor>Leiderer, Paul</dc:contributor>
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    <dcterms:bibliographicCitation>First publ. in: Applied Physics / A, Materials Science and Processing, 72 (2001), 1, pp. 41-44</dcterms:bibliographicCitation>
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    <dc:contributor>Boneberg, Johannes</dc:contributor>
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    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T17:51:04Z</dc:date>
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    <dc:contributor>Münzer, Hans-Joachim</dc:contributor>
    <dc:contributor>Zimmermann, Jörg</dc:contributor>
    <dc:creator>Mosbacher, Mario</dc:creator>
    <dc:contributor>Mosbacher, Mario</dc:contributor>
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