Colloid monolayers as versatile lithographic masks

Burmeister, Frank; Schäfle, Claudia; Matthes, Thomas; Böhmisch, Matthias; Boneberg, Johannes; Leiderer, Paul

Colloid monolayers as versatile lithographic masks

Dateien

192_lang_1997.pdfGröße: 254.33 KBDownloads: 553

Datum

1997

Autor:innen

Burmeister, Frank

Schäfle, Claudia

Matthes, Thomas

Böhmisch, Matthias

Boneberg, Johannes

Leiderer, Paul

Open Access-Veröffentlichung

Open Access Green

Sammlungen

Physik

Publikationstyp

Zeitschriftenartikel

Publikationsstatus

Published

Erschienen in

Langmuir. 1997, 13(11), pp. 2983-2987. Available under: doi: 10.1021/la9621123

Zusammenfassung

Hexagonally closed packed monolayers of colloids have found more and more applications, e.g. as lithographic masks. The monolayers are usually produced with the help of a self-organizing process where a suspension of colloids is applied to the desired substrate and left to dry. This method requires a good wettability and smoothness of the substrate, which severely limits the number of possible substrates. We present a new method for the application of colloid monolayers to almost any surface where these difficulties are circumvented. At first the monolayers are fabricated on glass substrates and afterwards floated off on a water surface. From there, they are transferred to the desired substrate. Examples where transferred monolayers were used as lithographic masks are shown on glass, indium tin oxide, and tungsten diselenide. The transfer of a colloid monolayer to a copper grid for transmission electron microscopy demonstrates the applicability of the technique to curved surfaces as well.

Fachgebiet (DDC)

530 Physik

Zitieren

ISO 690

BURMEISTER, Frank, Claudia SCHÄFLE, Thomas MATTHES, Matthias BÖHMISCH, Johannes BONEBERG, Paul LEIDERER, 1997. Colloid monolayers as versatile lithographic masks. In: Langmuir. 1997, 13(11), pp. 2983-2987. Available under: doi: 10.1021/la9621123

BibTex

@article{Burmeister1997Collo-5089,
  year={1997},
  doi={10.1021/la9621123},
  title={Colloid monolayers as versatile lithographic masks},
  number={11},
  volume={13},
  journal={Langmuir},
  pages={2983--2987},
  author={Burmeister, Frank and Schäfle, Claudia and Matthes, Thomas and Böhmisch, Matthias and Boneberg, Johannes and Leiderer, Paul}
}

RDF

<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/5089">
    <dcterms:title>Colloid monolayers as versatile lithographic masks</dcterms:title>
    <dc:contributor>Boneberg, Johannes</dc:contributor>
    <dc:creator>Burmeister, Frank</dc:creator>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/5089"/>
    <dc:creator>Böhmisch, Matthias</dc:creator>
    <dc:creator>Boneberg, Johannes</dc:creator>
    <dc:contributor>Böhmisch, Matthias</dc:contributor>
    <dcterms:rights rdf:resource="http://creativecommons.org/licenses/by-nc-nd/2.0/"/>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5089/1/192_lang_1997.pdf"/>
    <dc:creator>Matthes, Thomas</dc:creator>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dcterms:bibliographicCitation>First publ. in: Langmuir 13 (1997), 11, pp. 2983-2987</dcterms:bibliographicCitation>
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5089/1/192_lang_1997.pdf"/>
    <dc:contributor>Matthes, Thomas</dc:contributor>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:53:03Z</dcterms:available>
    <dcterms:issued>1997</dcterms:issued>
    <dc:language>eng</dc:language>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dc:contributor>Schäfle, Claudia</dc:contributor>
    <dc:rights>Attribution-NonCommercial-NoDerivs 2.0 Generic</dc:rights>
    <dc:format>application/pdf</dc:format>
    <dc:contributor>Burmeister, Frank</dc:contributor>
    <dc:contributor>Leiderer, Paul</dc:contributor>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:creator>Schäfle, Claudia</dc:creator>
    <dc:creator>Leiderer, Paul</dc:creator>
    <dcterms:abstract xml:lang="eng">Hexagonally closed packed monolayers of colloids have found more and more applications, e.g. as lithographic masks. The monolayers are usually produced with the help of a self-organizing process where a suspension of colloids is applied to the desired substrate and left to dry. This method requires a good wettability and smoothness of the substrate, which severely limits the number of possible substrates. We present a new method for the application of colloid monolayers to almost any surface where these difficulties are circumvented. At first the monolayers are fabricated on glass substrates and afterwards floated off on a water surface. From there, they are transferred to the desired substrate. Examples where transferred monolayers were used as lithographic masks are shown on glass, indium tin oxide, and tungsten diselenide. The transfer of a colloid monolayer to a copper grid for transmission electron microscopy demonstrates the applicability of the technique to curved surfaces as well.</dcterms:abstract>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:53:03Z</dc:date>
  </rdf:Description>
</rdf:RDF>

Universitätsbibliographie

Nein